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Automatic Lift-Off Device Product List

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No setup required! Inch-compatible automatic lift-off device.

Process multiple sizes of wafers without changing setups! The multi-size compatible device achieves high productivity with minimal downtime for lift-off operations!

No need for setup changes due to different wafer sizes, leading to increased productivity! There is a strong demand for different inch sizes depending on the type of product, and a desire to handle larger wafer sizes in the future. Therefore, we offer a lift-off device that can process multiple sizes without the need for setup changes. 【Examples of compatible multiple sizes】 "2-3", "2-4", "3-4", "4-6", "6-8" inches 【Also compatible with thin wafers!】 We often hear concerns that high-pressure jets might break thin wafers (substrates). Our company has a proven track record of lift-off with GaAs wafers of 120um thickness (pressure 3MPa). Pressure adjustments can be freely made depending on the device. 【Benefits of no setup changes for multiple wafer sizes】 ■ Reduced downtime and high operational efficiency ■ Prevents damage to equipment and devices due to adjustment errors after setup changes ■ Reduces processing recipe selection errors with automatic wafer size recognition ■ Burr removal ■ No reattachment of metal Please consider a demonstration first!

  • Resist Device

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Automatic lift-off device (metal resist stripping) Lift-off

Amazing peeling ability with high-pressure jets! Our unique special nozzle enables high-speed processing, high peeling power, and lift-off with low chemical consumption using sheet materials!

Physical and chemical W (double) effect lift-off! What is W effect lift-off? - Delamination using high-pressure jets (MAX 20MPa) with our unique special nozzle for physical force - Delamination using organic solvents such as NMP and DMSO for chemical force Additionally, it achieves high-speed processing, high delamination power, and high stability with sheet processing, while also reducing the amount of chemical solution used. It can also be used as a cleaning device for resist, polymers, and masks, capable of delaminating stubborn resist after thermal treatment or dry etching. Moreover, there is no re-adhesion of burrs or metals, which is a problem in DIP processing. This high-pressure jet lift-off device is suitable for patterning thick films that are difficult to etch, such as thick metal and oxide films. 【Features】 ■ Amazing delamination capability with W (double) effect lift-off! ■ Process stability with sheet-type processing ■ Removal of burrs during lift-off ■ No re-adhesion ■ Temperature-controlled chemical recycling system (optional) *For more details, please refer to the catalog or feel free to contact us.

  • Resist Device
  • Other semiconductor manufacturing equipment

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